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kw.\*:("Revestimiento antirreflexión")

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Fast etch anti-reflective coating for sub-0.35μm i-line microlithography applicationsWILLIAMS, P; XIE SHAO; LAMB, J et al.SPIE proceedings series. 1998, pp 518-525, isbn 0-8194-2777-2Conference Paper

Influence of bias current and signal power on behaviour of an antireflection-coated laser amplifierWEBB, R. P; DEVLIN, W. J.Electronics Letters. 1986, Vol 22, Num 5, pp 255-256, issn 0013-5194Article

Mechanism of damage formation in antireflection coatingsYOSHIDA, K; YABE, T; YOSHIDA, H et al.Journal of applied physics. 1986, Vol 60, Num 4, pp 1545-1546, issn 0021-8979Article

Optical reflection measurement system using a swept modulation frequency techniqueBRAUN, D. M; LEYDE, K. W.Optical engineering (Bellingham. Print). 1989, Vol 28, Num 3, pp 286-289, issn 0091-3286Article

Directly controlled deposition of antireflection coatings for semiconductor lasersSERENYI, M; HABERMEIER, H.-U.Applied optics. 1987, Vol 26, Num 5, pp 845-849, issn 0003-6935Article

Influence of external mirror on antireflection-coated phased-array semiconductor lasersHARDY, A; STREIFER, W; OSINSKI, M et al.Applied physics letters. 1986, Vol 49, Num 4, pp 185-187, issn 0003-6951Article

Optimization of ARC process in DUV lithographySHIM, K.-J; CHOI, B.-I; PARK, K.-Y et al.SPIE proceedings series. 1998, pp 692-701, isbn 0-8194-2779-9Conference Paper

Influence of underlayer reflection on optical proximity effects in sub-quarter micron lithographySEKIGUCHI, A; UESAWA, F; TAKEUCHI, K et al.SPIE proceedings series. 1998, pp 347-355, isbn 0-8194-2779-9Conference Paper

Anti-reflection coatings for grazing incidence anglesMONGA, J. C.Journal of modern optics (Print). 1989, Vol 36, Num 3, pp 381-387, issn 0950-0340Article

Improvement of the efficiency of the silicon solar cells by silicon incorporated diamond-like carbon antireflective coatingsBURSIKOVA, V; SLADEK, P; ST'AHEL, P et al.Journal of non-crystalline solids. 2002, Vol 299302, pp 1147-1151, issn 0022-3093, bConference Paper

Progressions in deep ultraviolet bottom antireflective coatingsBAILEY, George E; EIB, Nicholas K; MURPHY, Earnest C et al.SPIE proceedings series. 2000, pp 935-948, isbn 0-8194-3617-8Conference Paper

Dielectric antireflective coatings for DUV lithographyBENCHER, C; NGAI, C; ROMAN, B et al.Solid state technology. 1997, Vol 40, Num 3, pp 109-114, issn 0038-111X, 4 p.Article

Bottom anti-reflective coatings : control of thermal processingSCHILTZ, A; TERPAN, J.-F; BRUN, S et al.Microelectronic engineering. 1996, Vol 30, Num 1-4, pp 283-286, issn 0167-9317Conference Paper

Double-layer broadband antireflection coatings for grazing incidence anglesMONGA, J. C.Applied optics. 1992, Vol 31, Num 4, pp 546-553, issn 0003-6935Article

Continuation method for synthesizing antireflection coatingsRASTELLO, M. L; PREMOLI, A.Applied optics. 1992, Vol 31, Num 31, pp 6741-6746, issn 0003-6935Article

Entspiegelung intraokularer Linsen = Antireflection coating of intraocular lensesREINER, J; KREINER, C.Klinische Monatsblätter für Augenheilkunde. 1991, Vol 199, Num 1, pp 67-68, issn 0023-2165, 2 p.Article

All-oxide broadband antireflection coatings by reactive ion plating depositionBUEHLER, M; EDLINGER, J; EMILIANI, G et al.Applied optics. 1988, Vol 27, Num 16, pp 3359-3361, issn 0003-6935Article

Porous fluoride antireflective coatingsTHOMAS, I. M.Applied optics. 1988, Vol 27, Num 16, pp 3356-3358, issn 0003-6935Article

Theory and application of antiscattering single layers: antiscattering antireflection coatingsAMRA, C; ALBRAND, G; ROCHE, P et al.Applied optics. 1986, Vol 25, Num 16, pp 2695-2702, issn 0003-6935Article

Deep UV reflection control for patterning dielectric layersSUBRAMANIAN, R; BAINS, G. S; LYONS, C. F et al.SPIE proceedings series. 1998, pp 356-370, isbn 0-8194-2779-9Conference Paper

Simple measurement of the reflectivity of antireflection-coated laser diode facetsUKITA, H; MISE, K; KATAGIRI, Y et al.Japanese journal of applied physics. 1988, Vol 27, Num 6, pp L1128-L1130, issn 0021-4922, 2Article

Antireflection coatings for silicon charge-coupled devicesLESSER, M.Optical engineering (Bellingham. Print). 1987, Vol 26, Num 9, pp 911-915, issn 0091-3286Article

Advances in characterizing SiON for 0.18 and 0.25 micron technologiesRAHIM FOROUHI, A; LI, G. G; BLOOMER, I et al.SPIE proceedings series. 1998, pp 493-500, isbn 0-8194-2777-2Conference Paper

Linewidth control for 0.25 micron gate patterningFARRAR, N. R.Microelectronic engineering. 1996, Vol 30, Num 1-4, pp 111-114, issn 0167-9317Conference Paper

Method for choosing the components of two-phase composite materials for selective coatingsDYSKIN, V. G; GAZIEV, U. K.Applied solar energy. 1993, Vol 29, Num 4, pp 70-74, issn 0003-701XArticle

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